Researchers from Sichuan University in Chengdu, the National University of Singapore, and Ben-Gurion University of the Negev in Beersheva have discovered a naturally occurring chemical that lessens the biofilm that creates plaque and causes cavities.
The chemical 3,3′-diindolylmethane (DIM), also known as bisindole, was discovered to disrupt biofilm formation by 90%, preventing bacteria like Streptococcus mutans from growing and attacking enamel.
The journal Antibiotics published the findings earlier this month.
Lead author Professor Ariel Kushmaro of the Avram and Stella Goldstein-Goren Department of Biotechnology Engineering at Ben-Gurion University said, “The molecule, which was found to have low toxicity, could be added to toothpastes and mouthwashes to greatly improve dental hygiene.
Kushmaro is a member of the Goldman Sonnenfeldt School of Sustainability and Climate Change as well as the Ilse Katz Institute for Nanoscale Science and Technology.
Yifat Baruch, a student of Kushmaro’s, along with Dr. Karina Golberg, Professor Robert S. Marks, Qun Sun of Sichuan University, and Karina Yew-Hoong Gin of the National University of Singapore, all participated in the study.
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